FIB and Dual-beam FIB (Focused Ion beam) Analysis

1 FIB and Dual-beam FIB (Focused Ion beam) Analysis

    FIB is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, a FIB setup uses a focused beam of ions instead. FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These are generally quite different systems where the material is modified by other mechanisms. 

2 Key Analysis Items

   - IC Chip Circuit Modification

   - Intersecting Surface Analysis

   - Fixed Point Cross Section

   - Semiconductor Failure Analysis

   - TEM Specimen Preparation

   - Crystal Phase Analysis